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Pilot Flexible Air Permit Profile
Source: Intel Corporation
Facility Type: Semiconductor
fabrication
Location: Aloha, Oregon
The Oregon Department of Environmental Quality (ODEQ) and EPA worked
with Intel Corporation to develop the first flexible
title V air permit in the country. The permit enabled Intel to launch
new products without delays by allowing Intel to rapidly construct a fabrication
facility for a new generation of semiconductors and to make on-going operational
and equipment changes in a streamlined manner. This improved the company’s
ability to respond rapidly to new market opportunities,
to support continual improvement projects within the organization, and
to secure new work. The flexible permit ensured that all applicable regulatory
requirements are addressed and created incentives for pollution prevention.
In October 1995, Intel Corporation’s Aloha, Oregon semiconductor
fabrication facility received the first flexible title V permit (Permit
No. 34-2681) developed in U.S. Intel desired a permit for the Portland
area facility that would better enable the company to meet aggressive product
development schedules in a highly competitive semiconductor market.
Tools & Methods Used in the Pilot Permit
Alternative Operating Scenarios
(AOS) and Advanced Approvals |
Approvals for a broad class of operational
changes, provided no applicable requirements and MRR requirements are
triggered which are not covered in the permit. Approved changes
included relocation of and modifications to semiconductor manufacturing
equipment, as well as construction of new semiconductor fabrication
facility. |
Approved Replicable Methodologies (ARMs) |
|
Plantwide emissions caps |
Plant Site Emissions Limits (PSELs) for
VOC (190 tpy; 8 tons/week) and CO (32 tpy) capped total plantwide emissions
to prevent triggering of major NSR; Potential-to-emit (PTE) limits on
organic and inorganic hazardous air pollutants (HAPs) set at 10 tpy
to prevent triggering major source status for HAPs |
Pollution prevention (P2) |
Source-specific RACT limit based on units
of production, designed to rely upon and encourage P2; P2 Program and
reporting requirements |
Implementation logs |
Logs maintained to document changes made
under the AOS |
Environmental Benefits and Pollution Prevention
- Reduced allowable and actual air emissions. During the title V permit
term, Intel lowered its actual VOC emissions from
83 tons per year (tpy) to 56 tpy despite increasing production by more
than 300 percent, enabling the facility to become a synthetic minor source. During the permit
term, Intel donated 30 tpy of VOC capacity to emit to the State to assist
with meeting regional air quality improvement goals. Most of the
P2 gains at Aloha have been proliferated to other Intel facilities through
the company’s “copy exactly” process.
- Easier P2 implementation. The permit provided a framework
highly conducive to pollution prevention (P2) by
facilitating streamlining the process for making
equipment and operational changes. This enabled the facility to significantly
reduce solvent usage and VOC emissions (from approximately 90 tons per
billion production units to less than 20 tons per billion production units
in the period 1991 to 1995) without triggering costly and time-consuming
permitting actions.
Economic Competitiveness Benefits
- Agile manufacturing and new product introduction. As new generations
of computer chips are introduced every 12 to 24 months,
Intel typically needs to make 150 to 200 equipment and operational changes
per year that could trigger permitting action. Consequently, even short delays
due to air permitting can result in missed market opportunities. Intel
and industry estimates indicate that delays linked
to new product launch and equipment downtime can cost several millions
of dollars in just a few days.
- Making continuous improvement easy and
efficient. Intel
estimated that in the absence of the flexible permit,
it would have required approximately 150 to 200 additional
notice of construction applications per year, with
each application requiring an average of approximately 8 hours of staff
time, resulting in 1,200 to 1,600 hours per year. Intel
indicated that process experimentation and P2 is
substantially more attractive to them when it operates in an environment
of low administrative friction and high predictability with regard to
the applicability of regulatory requirements.
Monitoring and Enforceability
- Replicable monitoring and routine reporting. ODEQ and Intel chose a
chemical mass balance approach to monitoring, which is based on chemical
usage. In
practice this approach was conservative in its estimate of VOC emissions,
assuming all VOCs used were emitted to air, unless they could be otherwise
accounted for by the facility.
Corporate and Government Efficiency
- Compliance burden reduction. Intel estimated that each notice of construction
approval action would require approximately 8 hours
of staff time with each hour valued at $150. This translates into an administrative
cost of $1,200 per permit action and an annual cost between $180,000 and
$204,000. Intel representatives said that time spent on preparing construction
permit actions would divert attention and focus away from more forward
looking activities such as their design for environment program and in-process
pollution prevention efforts.
- Paperwork and backlog reduction. The permit saved ODEQ significant
staff time associated with processing notice of construction applications
from Intel’s Aloha facility. Even at a very low estimate of
2 staff hours per application, the staff time saved
is significant, at 300 to 400 hours per year.
Public Response
- Conventional public comment process. ODEQ held an optional, initial
public meeting in January 1995 to discuss the initial draft permit. Representatives
from two local non-governmental organizations attended the briefing, and
no comments were submitted. The permit went through the standard
title V public comment process in July 1995, including
a non-required public hearing, and again, no comments
were received.
- No Complaints. There was no record of public complaints related to
Intel’s Aloha facility.
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